The way organisations manage talent in a changing world is crucial to their successful transformation. Find out what leading employers are doing to attract, engage and develop talent by joining us for the Top Employers HR Conference 2019 at the Manchester Metropolitan University Business School on September 3rd 2019. Connect with senior HR professionals, discover the latest trends from the Top Employers Institute's exclusive and comprehensive research and feel inspired by our excellent speakers from some of the UK’s Top Employers including GroupM, Foster + Partners and Konica Minolta.
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9.00 Registration and Breakfast
9.30 Phil Sproston, Country Manager UK & Ireland for the Top Employers Institute: Welcome and ‘HR Trends 2019: Transformation through Talent.’
10.00 Professor Carol Atkinson, Associate Dean: Research at Manchester Metropolitan University: 'Unleashing professional women's potential at all career stages.'
10.45 Wendy Macdonald, HR Director UK and Ireland for AkzoNobel: 'Painting a picture of talent retention at AkzoNobel - how we are attracting and retaining our talent in colourful times.'
11.20 Coffee Break and Networking
11.50 Jennifer Gabrielle-Chapman, Group Talent Platforms Partner, EMEA for GroupM: ‘Hiring for the 4IR: how to get the balance right in talent acquisition, using technology and data.’
12.25 Lindsey Hayward, Head of Talent Management and Business Partnering, and Richard Kershaw, Workforce Planning Partner for Konica Minolta Business Solutions: ‘Rethinking skills for the future.’
13.00 Charlotte Sword, Global Head of HR and Laggi Diamandi, Head of L&D for Foster + Partners: ‘Education in Practice: how Foster + Partners have disrupted the architectural education system in the UK by addressing diversity, socio-economic challenges and improving access to professional development.’
13.35 Lunch and Networking
Manchester Metropolitan University Business School
To register, please fill in the form on the right. The event is free to attend, and tickets are available on a first come, first served basis.